EDN

Toppan, CEA-Leti to study double patterning

To extend 193-nm lithography to next-generation semiconductors, Round Rock, Texas-based photomask provider Toppan Photomasks Inc. and Grenoble, France-based technology R&D organization Electronics and ...
EDN

Synopsys’ Collaboration with Industry Consortium Yields Double Patterning Technology Models for Parasitic Extraction

DPT is a critical technique for ensuring printability of device and interconnect layers in 20-nm IC manufacturing. However, splitting layers into two masks can introduce timing variations as a ...
Nasdaq

Applied Materials Expands Patterning Solutions Portfolio for Angstrom Era Chipmaking

SAN JOSE, Calif., Feb. 26, 2024 (GLOBE NEWSWIRE) -- Today at the SPIE Advanced Lithography + Patterning conference, Applied Materials, Inc. introduced a portfolio of products and solutions designed to ...
AFP

DNP Achieves 10nm Line Pattern Resolution on Nanoimprint Template for Cutting-Edge Semiconductors

Dai Nippon Printing Co., Ltd. (DNP, TOKYO:7912) today announced the development of a nanoimprint lithography (NIL) template featuring a circuit line width of 10 nanometers (nm: 10-9 meter). The new ...