As technology nodes shrink to 90 nanometers and below, chips become much more difficult to manufacture. In-die process variations increase substantially at 90 nm — even more at 65 nm. If these effects ...

EDA (Electronic Design Automation) cell characterization tools have been used extensively to generate models for timing, power and noise at a rapidly growing number of process corners. Today, model ...

Open-Source Standards Board Collaboration with Leading Semiconductor Companies and Foundries Delivers Silicon Accuracy with No Change in IC Design Analysis Flows MOUNTAIN VIEW, Calif., Apr. 21, 2015 – ...