Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.
Pattern matching is best known for its use in detecting lithographic hotspots, but it’s also widely used across all physical verification flows, and has expanded into design-for-manufacturing (DFM) ...
How often have you struggled to verify static random-access memory (SRAM) blocks in your design? And how often, no matter how much time you spend on them, do they end up causing manufacturing issues?
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