Chip scaling is becoming more difficult at each process node, but the industry continues to find new and innovative ways to solve the problems at every turn. And so chipmakers continue to march down ...

Extreme ultraviolet (EUV) lithography finally is moving into production, but foundry customers now must decide whether to implement their designs using EUV-based single patterning at 7nm, or whether ...

A new organic material holds its shape under light and solvents, allowing engineers to build flexible, reliable electronics and light-sensitive devices without complex processing steps. (Nanowerk ...

Scanning probe microscopy (SPM) is a set of advanced methods for surface analysis. The recent advances in SPM of metals, polymers, insulating, and semiconductive materials are primarily due to the ...

Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...

As major foundries announce the release of their 1.0 versions of 20 nm processes, we now see IC designers moving to production design and implementation of integrated circuits at this node. For many ...

SAN JOSE, Calif., Feb. 26, 2024 (GLOBE NEWSWIRE) -- Today at the SPIE Advanced Lithography + Patterning conference, Applied Materials, Inc. introduced a portfolio of products and solutions designed to ...

Body axes are molecular coordinate systems along which regulatory genes are activated. These genes then activate the development of anatomical structures in correct locations in the embryo. Thus, the ...