In anticipation of the SPIE Microlithography conference next week, KLA-Tencor Corp. today unveiled its Process Window Monitor (PWM) Series of critical dimension (CD) metrology systems designed for sub ...

To address the urgent issue of how to manage process variability in the early stages of design creation, Mentor Graphics Corp. today announced its production-proven Calibre Litho-Friendly Design (LPD) ...

Over the past few years we’ve seen several impressive projects where people try to manufacture integrated circuits using hobbyist tools. One of the most complex parts of this process is lithography: ...

A lithographic (litho) hotspot is a defect on a wafer that is created during manufacturing by a combination of systematic process variation and resolution enhancement technology (RET) limitations.

Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...

Imagine a machine so advanced it operates with light invisible to the human eye, etching circuits onto silicon wafers at scales smaller than a virus. This is the world of EUV lithography, a ...

Lithography, based on conventional ink-printing processes, is a technique for patterning a variety of layers, such as conductors, semiconductors, or dielectrics, on a surface. Nanopatterning stretches ...

Extreme Ultraviolet (EUV) lithography represents a transformative advancement in semiconductor fabrication, utilising 13.5‐nm wavelength light to achieve remarkably fine feature sizes far below the 10 ...