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ASML EUV lithography machines fire 50,000 molten tin droplets per second in a vacuum; while hitting each droplet twice with a laser to generate EUV light. This requires mirrors
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What role does the reticle stage play in High NA extreme ultraviolet (EUV) lithography? In this video, learn how the reticle stage enables patterning in advanced chipmaking. You’ll see how 13.5 nanometer EUV light reflected into the system gets shaped by the illuminator and how a chip pattern gets encoded into the light for lithography. | ASML
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