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ieee.org
ASML Developing Next-Gen EUV Lithography
Productivity gains will continue through the next two or three chip generations, but after that we’ll need something bigger and better
Dec 5, 2018
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5.2K views · 113 reactions | At ASML San Diego — the global Center of Excellence for EUV light source development — engineers, scientists, and innovators work together to create the technology that powers the world's most advanced chips. From intercepting tin droplets with lasers to solving challenges that haven’t been defined yet — this is where the EUV light source truly comes to life. | ASML | Facebook
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